T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer It is not intended to

It is not intended to distinguish good from bad or desirable from undesirable

This Guide provides information about the frequency and location of sampling for those parameters that are not available from online analyzers

Current edition approved by the North American Regional Standards Committee on August 28

and other methods of measuring static charge as well as the performance parameters of static-control methods

T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer It is not intended toThis Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38. This Specification